“The core solution dictating yield in ultra-fine semiconductor manufacturing—driven by FNS Tech”
· Starting with the acquisition of INNO Pad Inc. in the US in 2013, we absorbed advanced technologies and combined them with our proprietary polymer material synthesis and R&D capabilities to achieve technological independence.
· We possess the process know-how to precisely control the size, density, and distribution of micro-pores in polyurethane at the nanoscale. This secures optimal slurry fluidity, maximizes polishing efficiency, and contributes to improving our customers' yield by reducing wafer surface defects. defects.
· We flexibly design pad properties, such as hardness and compressibility, tailored to rapidly changing semiconductor devices and next-generation process characteristics. Through customized pads optimized for specific process objectives, we perfectly achieve the extreme global planarity and precision required by our customers.
